Figure 3: Cross-sectional SEM image of the synthesized Silicon nanowires array for Ag treated samples. (a-b) Etched for 45 minutes with deposition time of 60 seconds. (c) Etched for 75 min with nanoparticle deposition time 60 seconds. In some location of the substrate, SiNWs are beginning to break apart (shown in the inset) as etching time is increased to 75 minutes. (d-e) Etched for 60 minutes with deposition time of 75 seconds with different magnification.