Periodic Structures, Inc. and RenderStream ,USA
Periodic Structures, Inc. and RenderStream
John Petersen has extensive experience in all aspects of lithography and a strong modeling background. John has been heavily involved in advanced design and manufacturing of photomasks for extremely high resolution optical lithography. He has experience from Texas Instruments, Shipley Company, SEMATECH and Petersen Advanced Lithography, Inc. John is co-developer of the 2006 SEMI Innovation Award winning Maxwell equation solver EMF3. He began his direct involvement with interference lithography working with Steve Brueck at the UNM as a technical advisory board member of the Nanolithography MURI. John is a fellow of SPIE. He has published more than sixty-five papers, often an invited speaker, taught advanced optical lithography for many years holds seven patents. He is known worldwide for describing the chemical-physics of chemically amplified resists (Byers-Petersen Reaction Diffusion Equations) and for his work in advanced optical lithography. His current research uses multi-wavelength optical lithography to extend resolution to the 10 nm half-pitch.
Lithography, Semiconductors,Modeling and Nanotechnology