Design Study Thin Film Multi-Cavity sharpness pulses applied in communications Field
Amer B.Dheyab, Gaillan H. Abdullah, Ali Hassan and Haider Y. Hammod
Ministry of science and technology/Directorate of material Research /center of laser research
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We present design thin film multi-cavity sharpness pulses applied in communications Field. These filters are most widely used filtration technologies that made possible technical advancement of modern optical communication system.This paper is concerned with a theoretical study on optoelectronics physics to design and analyze this type of filter. A brief introduction to the thin film sharpness pulses applied in communications Field. Technology will be presented. The recent progress in design thin film multi-cavity technology will be reviewed. These designs consist of two material TiO2 / SiO2 as high / low index. The wavelength range 710 - 1025nm and detecting number of channels (20channels) at different wavelengths. The filter is to be coated on substrate Fused Silica having index 1.55 and the design operates at incident angle (450).