alexa Controlled Synthesis Of Vertical And Planar Graphenes Using Plasma-enhanced Chemical Vapor Deposition
ISSN: 2169-0022

Journal of Material Sciences & Engineering
Open Access

OMICS International organises 3000+ Global Conferenceseries Events every year across USA, Europe & Asia with support from 1000 more scientific Societies and Publishes 700+ Open Access Journals which contains over 50000 eminent personalities, reputed scientists as editorial board members.

Open Access Journals gaining more Readers and Citations

700 Journals and 15,000,000 Readers Each Journal is getting 25,000+ Readers

This Readership is 10 times more when compared to other Subscription Journals (Source: Google Analytics)

Share This Page

Additional Info

Loading Please wait..

9th World Congress on Materials Science and Engineering
June 12-14, 2017 Rome, Italy

Mineo Hiramatsu
Meijo University, Japan
ScientificTracks Abstracts: J Material Sci Eng
DOI: 10.4172/2169-0022-C1-067
Graphene is a promising material for future electronic applications due to its outstanding properties. Planar graphene films have been synthesized using mechanical exfoliation from HOPG and chemical vapor deposition (CVD) on metals such as Ni and Cu. On the other hand, plasma-enhanced CVD (PECVD) is among the early methods to synthesize vertically standing few-layer graphenes or carbon nano walls (CNWs). CNWs are few-layer graphenes standing vertically on a substrate to form a self-supported network of wall structures. The maze-like architecture of CNWs with large-surface-area graphene planes would be useful as electrodes for energy storage devices, electrochemical and biosensors, and scaffold for cell culturing. We have investigated the synthesis of CNWs and planar few-layer graphene using PECVD with controlling the ion flux incident on the substrate and surface pretreatment. In the present study, CNW growth using inductively coupled plasma (ICP) enhanced CVD is featured, since the ICP CVD system has advantages of simple design and scalability to large area growth. For the growth of CNWs, ion bombardment on the substrate surface would play an important role in nucleation by creating active sites for neutral radical bonding, resulting in the formation of vertical nanographene even in the case using Ni and Cu as substrates. On the other hand, by reducing the ion flux or ion energy incident on the substrate, it became possible to suppress the nucleation of CNWs under the typical plasma condition for the growth of CNWs. We report the current status of the control of the CNW structures during the growth processes as well as post treatment to be used as platform of the electrochemical and bio applications.

Mineo Hiramatsu is a Full Professor in the Department of Electrical and Electronic Engineering and the Director of Nanocarbon Research Center, Meijo University, Japan. He also serves as the Director of Research Institute, Meijo University. He served as the Director of the Japan Society of Applied Physics. His main fields of research are plasma diagnostics and plasma processing for the synthesis of thin films and nanostructured materials. He is the author of more than 100 scientific papers and patents on plasma processes for materials science. He is a member of organizing and scientific committees of international conferences on plasma chemistry and plasma processing: International Conference on Reactive Plasmas, International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, International Symposium on Dry Process, International Conference on Advanced Nanomaterials, THERMEC, International Conference on Processing and Manufacturing of Advanced Materials.

Email: [email protected]

image PDF   |   image HTML

Relevant Topics

Peer Reviewed Journals
Make the best use of Scientific Research and information from our 700 + peer reviewed, Open Access Journals
International Conferences 2017-18
Meet Inspiring Speakers and Experts at our 3000+ Global Annual Meetings

Contact Us

© 2008-2017 OMICS International - Open Access Publisher. Best viewed in Mozilla Firefox | Google Chrome | Above IE 7.0 version