alexa Mass Spectrometry Diagnostics In Highly Ionized Plasma: A Key Tool To Optimize The Sputtering Process And The Film Growth | 67065
ISSN: 2157-7064

Journal of Chromatography & Separation Techniques
Open Access

Like us on:

OMICS International organises 3000+ Global Conferenceseries Events every year across USA, Europe & Asia with support from 1000 more scientific Societies and Publishes 700+ Open Access Journals which contains over 50000 eminent personalities, reputed scientists as editorial board members.

Open Access Journals gaining more Readers and Citations
700 Journals and 15,000,000 Readers Each Journal is getting 25,000+ Readers

This Readership is 10 times more when compared to other Subscription Journals (Source: Google Analytics)

4th World Congress on MASS SPECTROMETRY

Julien Keraudy
University of Nantes, France
ScientificTracks Abstracts: J Chromatogr Sep Tech
DOI: 10.4172/2157-7064-C1-025
Abstract
High power impulse magnetron sputtering (HiPIMS) is a new method for physical vapor deposition (PVD) based on magnetron sputtering. It utilizes transient impulse (short pulse) glow discharges with very high power and current density (up to 3 kW cm-2 and 4 A cm-2 respectively at a duty cycle of < 5%). Under these conditions the plasma density near the target increases sufficiently to ionize a significant proportion of the sputtered metal ions thus creating a high-efficiency metal ion source. Compare to conventional processes, HiPIMS discharges give increased possibilities to use ionized the metal flux for bombardment but have also demonstrated to be an elegant solution for controlling the chemical composition, energy and trajectory of the ion current arriving at the film growth surface. This fine control of the metal ion flux has found plenty of applications for cutting tools, especially for deposition on complex geometries, enhancement of the adhesion between coatings and substrates, enhancement of the optical films properties, substrate pre-treatment for anti-corrosion coatings, and more recently for the low-temperature epitaxial growth of nitride coatings on MgO substrates. These achievements have mainly been possible thanks to a detailed comprehensive study of the plasma-surface interaction phenomena, especially at the plasma-growing film interfaces. Among the most common plasma diagnostic methods, mass spectrometry is proven to be a powerful tool to monitor the ion dynamics in HiPIMS discharges by examining the ion energy distribution function (IEDF). Through the presentation of different examples of innovative coatings as well as low-temperature epitaxial growth, the benefits of mass spectrometry in highly ionized plasma will be presented.
Biography

Julien Keraudy was born in Brest, France, in 1989. He received the M.Sc. degree in physics and the Magister science from the University of Rennes, Rennes, France, in 2012, and the Ph.D degree in physics from the University of Nantes, Nantes, France in 2015. He is currently a Post-Doctoral Fellow in the division of Plasma & Coatings physics, Department of Physics, Chemistry and Biology (IFM), Linköping University, Sweden, where he is involved in plasma diagnostic and growth of thin films deposited by HiPIMS discharge.

Email: [email protected]

image PDF   |   image HTML
 
Peer Reviewed Journals
 
Make the best use of Scientific Research and information from our 700 + peer reviewed, Open Access Journals
International Conferences 2018-19
 
Meet Inspiring Speakers and Experts at our 3000+ Global Annual Meetings

Contact Us

Agri & Aquaculture Journals

Dr. Krish

[email protected]

+1-702-714-7001Extn: 9040

Biochemistry Journals

Datta A

[email protected]

1-702-714-7001Extn: 9037

Business & Management Journals

Ronald

[email protected]

1-702-714-7001Extn: 9042

Chemistry Journals

Gabriel Shaw

[email protected]

1-702-714-7001Extn: 9040

Clinical Journals

Datta A

[email protected]

1-702-714-7001Extn: 9037

Engineering Journals

James Franklin

[email protected]

1-702-714-7001Extn: 9042

Food & Nutrition Journals

Katie Wilson

[email protected]

1-702-714-7001Extn: 9042

General Science

Andrea Jason

[email protected]

1-702-714-7001Extn: 9043

Genetics & Molecular Biology Journals

Anna Melissa

[email protected]

1-702-714-7001Extn: 9006

Immunology & Microbiology Journals

David Gorantl

[email protected]

1-702-714-7001Extn: 9014

Materials Science Journals

Rachle Green

[email protected]

1-702-714-7001Extn: 9039

Nursing & Health Care Journals

Stephanie Skinner

[email protected]

1-702-714-7001Extn: 9039

Medical Journals

Nimmi Anna

[email protected]

1-702-714-7001Extn: 9038

Neuroscience & Psychology Journals

Nathan T

[email protected]

1-702-714-7001Extn: 9041

Pharmaceutical Sciences Journals

Ann Jose

[email protected]

1-702-714-7001Extn: 9007

Social & Political Science Journals

Steve Harry

[email protected]

1-702-714-7001Extn: 9042

 
© 2008- 2018 OMICS International - Open Access Publisher. Best viewed in Mozilla Firefox | Google Chrome | Above IE 7.0 version
Leave Your Message 24x7