Author(s): Ilaiyaraja P, Deb AK, Sivasubramanian K, Ponraju D, Venkatraman B
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Abstract A new polymeric chelating resin was prepared by growing third generation poly(amido)amine (PAMAMG3) dendron on the surface of styrene divinylbenzene (SDB) and characterized by FTIR, TGA and SEM. The ideal branching of dendron in the chelating resin was determined from potentiometric titration. Adsorption of uranium (VI) from aqueous solution using PAMAMG3-SDB chelating resin was studied in a series of batch experiments. Effect of contact time, pH, ionic strength, adsorbent dose, initial U(VI) concentration, dendron generation and temperature on adsorption of U(VI) were investigated. Kinetic experiments showed that U(VI) adsorption on PAMAMG3-SDB followed pseudo-second-order kinetics model appropriately and equilibrium data agreed well with the Langmuir isotherm model. Thermodynamic parameters (ΔH°, ΔS°, ΔG°) were evaluated from temperature dependent adsorption data and the uranium adsorption on PAMAMG3-SDB was found to be endothermic and spontaneous in nature. The sticking probability value (5.303 × 10(-9)), kinetic and isotherm data reveal the chemisorption of uranium on PAMAMG3-SDB and adsorption capacity of the chelating resin was estimated to be 130.25 mg g(-1) at 298 K. About 99\% of adsorbed U(VI) can be desorbed from PAMAMG3-SDB by a simple acid treatment suggesting that the chelating resin is reusable. Copyright © 2013 Elsevier B.V. All rights reserved.
This article was published in J Hazard Mater
and referenced in Journal of Chemical Engineering & Process Technology