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Volume 7, Issue 6(Suppl)

J Chromatogr Sep Tech

ISSN: 2157-7064 JCGST, an open access journal

Page 54

Notes:

Separation Techniques 2016

September 26-28, 2016

conferenceseries

.com

Separation Techniques

September 26-28, 2016 Valencia, Spain

2

nd

International Conference and Expo on

Nanoscale wiring by Cu electrodeposition in supercritical CO

2

emulsified electrolyte with

continuous-flow reaction system

Masato Sone

1, 2

, Tso Fu Mark Chang

1, 2

, Tetsuya Shimizu

1

and

Nao Shinoda

1

1

Tokyo Institute of Technology, Japan

2

Japan Science and Technology Agency, Japan

C

opper wiring into nanoscale holes with high aspect ratio by electrodeposition is an important problem for 3-D integration

in integrated circuit technology toward miniaturization of electronic devices. However, void and pinhole found in Cu

wiring for the integration can cause trouble for miniature device. Cu electroplating method without void and pinhole is

needed. We have proposed novel electroplating methods with supercritical carbon dioxide (sc-CO

2

) emulsion (EP-SCE). The

electrochemical reaction is carried out in an emulsion of sc-CO

2

in electrolyte with surfactants. Sc-CO

2

has low viscosity

and compatibility of hydrogen. Thus, this method is applicable in fine Cu wiring. The aim of this report is to examine Cu

electrodeposition by using sc-CO

2

emulsified electrolyte into nano-scale Cu wiring on the viewpoints of dissolution of Cu seed

layer, gap-filling capability into nano-scale holes and contamination in the plated Cu. Moreover a continuous-flow reaction

system is proposed and examined for filling of Cu into holes with 60 nm in diameter and aspect ratio of 2 and 5 by EP-SCE on

a round-type large-area hole test element group with diameter of 300 mm, which has an integrated structure of Cu seed layer

on TiN barrier layer sputtered on Si substrates.

Biography

Masato Sone has completed his Doctor degree of Engineering at Tokyo Institute of Technology. He has worked as a Researcher in Nippon Oil Company from 1996

to 2000. He was an Assistant Professor and then a Research Associate Professor at Tokyo University of Agriculture & Technology from 2000 to 2005, and became

an Associate Professor at Tokyo Institute of Technology in 2005 and working till date. He has published more than 127 papers in scientific journals and 18 books. His

majorities are microelectronics, surface finishing, chemical engineering, liquid crystal and polymer science. His recent research topic has been “Novel Nano Wiring

Process Using Supercritical Carbon Dioxide for Integrated Circuit Technology”.

sone.m.aa@m.titech.ac.jp

Masato Sone et al., J Chromatogr Sep Tech 2016, 7:6(Suppl)

http://dx.doi.org/10.4172/2157-7064.C1.019